March 1, 2011
High-k Metal Gate Characterization Using Picosecond Ultrasonic Technology
Solid State Technology, March 2011
"The semiconductor industry is still in the early deployment phase of using high-k metal gates (HKMG) to overcome high leakage currents and higher power consumption of advanced devices. A particular challenge associated with implementing HKMGs is monitoring gate height. This article describes how picosecond ultrasonic technology can be used during various stages of process development, integration, and volume manufacturing for monitoring the HKMG stack."