The S3000S™ Metrology System is designed for in-line process control of 300mm advanced diffusion and fabwide thin film applications
Its innovative optical design enables simultaneous measurement with multi-wavelength, multi-angle Focused Beam Ellipsometry (FBE) reducing measurement time and significantly increasing throughput over previous generations. In combination with FBE, S3000S is also available with optional 190nm Deep UV Reflectometry (DUVR), and optional Visible Reflectometer (VISR) to provide full fabwide thin film metrology capability.
- Designed for thinner films and tighter process tolerances at 28nm and 22nm nodes
- Laser light sources offer industry-leading stability and matching with long service life
- Simultaneous FBE provides high throughput for multilayer measurements
- Highly repeatable characterization of complex films
- Small beam size enables measurements in test sites to 40x40µm
- Optional MAControl module for integrated whole wafer removal of molecular airborne contamination